Georgie Lyall – Forbidden Fruit HD 720pGeorgie Lyall – Forbidden Fruit HD 720p
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netcoreapp3.1
A design fault in a three-dimensional mask or reticle for a thin film pattern etching process may be generated due to various causes, for example, 1) a layout defect occurring in the three-dimensional mask or reticle, 2) a feature volume defect such as a hole or break in a region containing a projection or a taper, and 3) a mold defect of a metal or dielectric material layer. As described above, a defective pattern may lead to defective patterns in an upper layer and, accordingly, it is an important theme to improve the yield of three-dimensional mask or reticle design.
A conventional repair technique analyzes the three-dimensional mask or reticle design data to detect a defective pattern, divides it into individual defective patterns, and repairs the individual defective patterns. By dividing the defective pattern into individual defective patterns, it is possible to analyze each defective pattern easily. Also, by repairing each defective pattern, it is possible to reuse the defective pattern itself and prevent the number of wasted defective patterns from increasing.
However, if a defective pattern in the three-dimensional mask or reticle design data is divided into a plurality of defective patterns, the possible reuse of the defective pattern is greatly restricted. That is, if each defective pattern is divided into a plurality of defective patterns, it is not considered to reuse the defective pattern itself, but only to classify the defective patterns. Therefore, even if the defective pattern has an effect on the process, it is not considered to reuse the defective pattern, and the defective pattern is considered to be dropped.
When the three-dimensional mask or reticle
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